High-volume Spatial ALD is finally here
Kalpana Systems is the first to make ALD available for high-volume roll-to-roll manufacturing
The world’s first high-volume S-ALD solution
Kalpana Systems is proud to announce an S-ALD technology with a throughput and up-time superior to all currently available alternatives. Among thin-film coating technologies, Atomic Layer Deposition is the one that delivers superior coating conformality, density and stoichiometry while the product remains at atmospheric pressure and low temperature. A broad range of products can be coated with a variety of materials. Kalpana Systems utilises its superspatial precursor separation technology in a new solution which outperforms all competition in throughput as well as uptime. High-volume roll-to-roll ALD is now available to improve manufacturing in many industries.
There are no alternatives for high-volume ALD
Inline S-ALD
Incorporate S-ALD in your existing production line
Reliable
Low contamination and easy maintenance results in high uptime and low TCOO
Variable width
From 300 mm up to 3000 mm
About Kalpana Systems
Kalpana Systems builds on more than 20 years of experience in S-ALD process and equipment development.
Kalpana Systems is committed to enable and improve high-volume manufacturing by delivering Roll-to-Roll S-ALD equipment that meets its customers throughput, uptime, and cost requirements.
As an interested potential customer you are invited to visit Kalpana Systems in Delft.
